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TitanTM Valved Effusion
Cell |
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Introducing the TitanTM Valved Effusion Cell for Ga and In
evaporation. Users are able to
instantly change flux through the use of a
mechanical valve. Excellent shut off
conserves source material and reduces
unwanted deposition into the chamber. |
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TitanTM Effusion Cell |
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The latest technology for
evaporating Ga or In source material.
It utilizes a special two-piece graphite
crucible that lowers defect counts, improves
uniformity and reduces shutter related flux
transients. |
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Dual Filament Effusion Cell |
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Dual filament and dual thermocouple allows
users to tailor the thermal profile of the
cell. |
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Single Filament Effusion Cell |
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A good basic
design that can be used to evaporate a
variety of different source materials. |
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High Temperature Effusion Cell |
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Three versions
available depending on the application.
The 10cc for research on small wafer sizes.
The 6 cc that utilizes a conical crucible
for uniformity across 3". The 25cc is
used in large production reactors and can
deposit uniformly on a multi-wafer platen. |
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Dopant Effusion Cell |
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Multiple
configurations available including the
standard single dopant cell, the dual dopant
cell and a combination dopant source with
gas injector. |
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Substrate Heaters |
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Substrate
heaters available for both MBE and MOCVD
reactors. Configurations available
include heaters for nitride applications,
oxide applications as well as the more
standard heaters for common material
systems. |
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Atomic Hydrogen Source |
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The E-Science
Atomic Hydrogen Source mounts onto a 4.5"
flange and can be installed in a variety of
different orientations. |
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Warranty
All E-Science products
are warranted from defects in material and
workmanship for 1 year from the date of
purchase. This warranty does not
include damage due to crucible failure,
excessive current applied to the filament or
operating in non-UHV conditions.
Damage not covered under this warranty will
be repaired quickly and at a reasonable
cost. |
